Water Treatment Combined Chlorine (Monochloramine) Degradation using Direct Photolysis and Homogeneous Photocatalysis (UV/H2O2, UV/NaOCl) with a Medium Pressure (MP) Lamp as a Source of UV

化学 激进的 光催化 光化学 光解 对苯二甲酸 闪光光解 降级(电信) 羟基自由基 亚硝酸盐 动力学 核化学 反应速率常数 硝酸盐 催化作用 有机化学 量子力学 聚酯纤维 电信 物理 计算机科学
作者
Ala Abdessemed,K. Djebbar,Amer S. El‐Kalliny,Tahar Sehili,Henk Nugteren,Peter W. Appel
出处
期刊:International Journal of Chemical Reactor Engineering [De Gruyter]
卷期号:12 (2): 671-681 被引量:8
标识
DOI:10.1515/ijcre-2014-0013
摘要

Abstract The objective of this study is to investigate the use of photochemical systems (photolysis, H 2 O 2 /UV MP and NaOCl/UV MP ) to deplete monochloramine compound with a medium pressure lamp as an irradiation source (200–600 nm). First, it was found that the direct photolysis treatment was a suitable method to degrade the given compound and that this degradation was greatly enhanced by H 2 O 2 /UV MP . This could be attributed to radical • OH produced in great amount by the photolysis of H 2 O 2 . However, no big advantages were observed when we used NaOCl/UV MP system. Indeed, this process generated radical • OH (but in feeble amount) and also radical Cl • (to form chloramins) and leading consequently to a less degradation rate comparatively to that obtained with H 2 O 2 /UV MP . This could be explained by a competition between the two species: • OH and Cl • for the compound. In addition, kinetics data for the three systems were best represented by a pseudo-first-order model and the photodecomposition of NH 2 Cl has led to the formation of nitrite, nitrate without forming ammonia. It is essential to mention that • OH radicals produced from H 2 O 2 /UV MP and NaOCl/UV MP was detected by a photoluminescence (PL) technic using terephthalic acid (TA) as a probe molecule.
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