Local‐Curvature‐Controlled Non‐Epitaxial Growth of Hierarchical Nanostructures

Abstract Site‐selective growth on non‐spherical seeds provides an indispensable route to hierarchical complex nanostructures that are interesting for diverse applications. However, this has only been achieved through epitaxial growth, which is restricted to crystalline materials with similar crystal structures and physicochemical properties. A non‐epitaxial growth strategy is reported for hierarchical nanostructures, where site‐selective growth is controlled by the curvature of non‐spherical seeds. This strategy is effective for site‐selective growth of silica nanorods from non‐spherical seeds of different shapes and materials, such as α‐Fe 2 O 3 , NaYF 4 , and ZnO. This growth strategy is not limited by the stringent requirements of epitaxy and is thus a versatile general method suitable for the preparation of hierarchical nanostructures with controlled morphologies and compositions to open up a verity of applications in self‐assembly, nanorobotics, catalysis, electronics, and biotechnology.