阴极
二极管
材料科学
薄脆饼
光电子学
热的
功率半导体器件
电气工程
工程类
电压
物理
气象学
作者
K. Nakamura,Koji Tanaka,Naoyuki Takeda,Mikihito Suzuki,Yusuke Kawase
标识
DOI:10.1109/ispsd49238.2022.9813620
摘要
We present the first advanced power diode technology that matches the diameter of a large Si wafer (≥200mm). Our proposed diode consists of a new cathode with a thin wafer process-induced crystal defect layer and a double-implanted layer in combination with a relaxed field of cathode technology. The new diode demonstrates high-speed operation, a low cross-point current, a low junction leakage current, and improved dynamic robustness without a lifetime control technique. The thermal stability of the proposed cathode concept is equal to that of a defect free power diode. The proposed cathode concept further evolves the RFC diode technology.
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