材料科学
异质结
光电子学
透明导电膜
铟
硅
还原(数学)
太阳能电池
溅射
工程物理
纳米技术
薄膜
工程类
几何学
数学
作者
F. Jay,Tristan Gageot,Gabriel Pinoit,Benjamin Thiriot,Jordi Veirman,R. Cabal,Sylvain De Vecchi,Wilfried Favre,Marcello Sciuto,C. Gerardi,Marina Foti
出处
期刊:Solar RRL
[Wiley]
日期:2022-12-16
卷期号:7 (8)
被引量:4
标识
DOI:10.1002/solr.202200598
摘要
Herein, the interest of a sputtering power reduction during physical vapor deposition (PVD) of the rear side indium‐based transparent conduction oxide (TCO) is investigated to reduce the In consumption in silicon heterojunction (SHJ) solar cells. Halving the supplied power allows for a TCO thickness reduction of 50%. Process fine‐tuning is shown to retain satisfying TCO electrical properties, thus preventing unwanted additional resistance losses despite the drastic reduction in TCO thickness. The produced SHJ solar cells with a 50% reduced TCO thickness show similar performances to those made with the reference process. Using thinner TCO layers at the cell backside is, however, found to come with a bifaciality penalty, which is discussed in detail.
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