Oxygen vacancy-rich β-Bi2O3/Bi2O2SiO3 Z-Scheme heterojunction: A strategy to enhance visible light-driven photocatalytic removal of ARB and ARGs

Oxygen vacancy-rich β-Bi2O3/Bi2O2SiO3 (BO/BOS) Z-Scheme heterojunction was prepared by hydrothermal method-assisted calcination. Under visible light, β-Bi2O3/Bi2O2SiO3 photocatalyst demonstrated superior photocatalytic efficacy in degrading antibiotics and antibiotic-resistant Escherichia coli (AR E. coli) compared to individual β-Bi2O3 and Bi2O2SiO3. The experimental results showed that BO/BOS-450 sample possessed the best photocatalytic activity against tetracycline (2 h, 80.8%), amoxicillin (4 h, 57.9%) and AR E. coli (3 h, 107.43 CFU·mL-1). BO/BOS-450 sample showed 91.8% electrostatic capture of AR E. coli in the bacterial capture experiment. In the antibiotic-resistant genes (ARGs) transformation experiment, the tetracycline-resistant, amoxicillin-resistant and ceftriaxone-resistant genes were completely removed after 4 h. Oxygen vacancies (OVs) were verified through HR-TEM, XPS and EPR analyses. ESR experiments aligned with the quenching experiment results, confirming that the crucial active species were •O- 2 and h+ during photocatalytic sterilization. A small-scale sewage treatment equipment was designed for the effective removal of ARB from real water samples.