二硫化钼
材料科学
各向同性腐蚀
蚀刻(微加工)
单层
图层(电子)
基质(水族馆)
Crystal(编程语言)
双层
薄膜
化学工程
钼
纳米技术
复合材料
冶金
化学
膜
工程类
地质学
海洋学
程序设计语言
生物化学
计算机科学
作者
Kiran Kumar Amara,Leiqiang Chu,Rajeev Kumar,Matthias Paul Han Sim Toh,Goki Eda
出处
期刊:APL Materials
[American Institute of Physics]
日期:2014-08-28
卷期号:2 (9)
被引量:29
摘要
We report on the preparation of mono- and bi-layer molybdenum disulfide (MoS2) from a bulk crystal by facile wet chemical etching. We show that concentrated nitric acid (HNO3) effectively etches thin MoS2 crystals from their edges via formation of MoO3. Interestingly, etching of thin crystals on a substrate leaves behind unreacted mono- and bilayer sheets. The flakes obtained by chemical etching exhibit electronic quality comparable to that of mechanically exfoliated counterparts. Our findings indicate that the self-limiting chemical etching is a promising top-down route to preparing atomically thin crystals from bulk layer compounds.
科研通智能强力驱动
Strongly Powered by AbleSci AI