Systematic Study of Oxygen Vacancy Tunable Transport Properties of Few‐Layer MoO3−x Enabled by Vapor‐Based Synthesis

材料科学 三氧化钼 兴奋剂 密度泛函理论 X射线光电子能谱 空位缺陷 电子能量损失谱 氧气 化学气相沉积 纳米技术 透射电子显微镜 图层(电子) 化学工程 光电子学 结晶学 计算化学 化学 有机化学 冶金 工程类
作者
Eve D. Hanson,Luc Lajaunie,Shiqiang Hao,Benjamin D. Myers,Fengyuan Shi,Akshay A. Murthy,Chris Wolverton,Raúl Arenal,Vinayak P. Dravid
出处
期刊:Advanced Functional Materials [Wiley]
卷期号:27 (17) 被引量:110
标识
DOI:10.1002/adfm.201605380
摘要

Bulk and nanoscale molybdenum trioxide (MoO 3 ) has shown impressive technologically relevant properties, but deeper investigation into 2D MoO 3 has been prevented by the lack of reliable vapor‐based synthesis and doping techniques. Herein, the successful synthesis of high‐quality, few‐layer MoO 3 down to bilayer thickness via physical vapor deposition is reported. The electronic structure of MoO 3 can be strongly modified by introducing oxygen substoichiometry (MoO 3− x ), which introduces gap states and increases conductivity. A dose‐controlled electron irradiation technique to introduce oxygen vacancies into the few‐layer MoO 3 structure is presented, thereby adding n‐type doping. By combining in situ transport with core‐loss and monochromated low‐loss scanning transmission electron microscopy–electron energy‐loss spectroscopy studies, a detailed structure–property relationship is developed between Mo‐oxidation state and resistance. Transport properties are reported for MoO 3− x down to three layers thick, the most 2D‐like MoO 3− x transport hitherto reported. Combining these results with density functional theory calculations, a radiolysis‐based mechanism for the irradiation‐induced oxygen vacancy introduction is developed, including insights into favorable configurations of oxygen defects. These systematic studies represent an important step forward in bringing few‐layer MoO 3 and MoO 3− x into the 2D family, as well as highlight the promise of MoO 3− x as a functional, tunable electronic material.
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