光催化
催化作用
降级(电信)
吸附
路易斯酸
氧化还原
光降解
过氧化氢
化学
猝灭(荧光)
铈
氧气
光化学
化学工程
材料科学
组合化学
无机化学
有机化学
计算机科学
量子力学
工程类
物理
荧光
电信
作者
Guanwei Peng,Yanyu Xie,Hui Chen,Jin Zou,Li Li,Chuanfa Luo,Limin Lu,Guojiang Mao
出处
期刊:Chemosphere
[Elsevier BV]
日期:2024-04-08
卷期号:356: 141952-141952
被引量:1
标识
DOI:10.1016/j.chemosphere.2024.141952
摘要
Photo-Fenton-like technology based on H2O2 is considered as an ideal strategy to generate reactive oxygen species (ROS) for antibiotic degradation, but O2 overflow in the process severely limits the utilization efficiency of H2O2. Herein, we fabricate Bi2MoO6 (BMO) photocatalyst modified with Frustrated Lewis pairs (FLPs) as a Fenton catalyst model for enhancing reuse of spilled O2. The FLPs created by the introduction of cerium and oxygen vacancy were found to contribute to regulate the electronic structure of BMO and further improve the acidic and basic properties of photocatalyst surface. More importantly, the frustrated acid and base sites can enhance the H2O2 and O2 interfacial adsorption process and provide an Ce4+-Ov-O2− active site on the surface of Ce-BMO nanosheets, which can promote O2/•O2−/1O2/H2O2 redox cycles to achieve high H2O2 utilization efficiency. Specifically, in the experiment using tetracycline as a photocatalytic degradation object, the degradation activity of Ce-BMO was 2.15 times higher than that of BMO pure phase. Quenching experiments and EPR assays also confirmed that 1O2 and •O2– were the dominant oxidative species. This study systematically reveals the design of Fenton photocatalytic active sites at the atomic scale and provides new insights into constructing FLPs photocatalysts with high H2O2 utilization efficiency.
科研通智能强力驱动
Strongly Powered by AbleSci AI