材料科学
等离子体增强化学气相沉积
氮化硅
折射率
椭圆偏振法
薄脆饼
反射计
化学气相沉积
体积流量
沉积(地质)
表面粗糙度
折射率分布
光电子学
波导管
光学
硅
分析化学(期刊)
薄膜
氮化硅
纳米技术
复合材料
化学
沉积物
古生物学
计算机科学
物理
时域
生物
量子力学
色谱法
计算机视觉
作者
Ľuboš Podlucký,Á. Vincze,Soňa Kováčová,Juraj Chlpík,Jaroslav Kováč,F. Uherek
出处
期刊:Coatings
[Multidisciplinary Digital Publishing Institute]
日期:2021-05-15
卷期号:11 (5): 574-574
被引量:11
标识
DOI:10.3390/coatings11050574
摘要
In this paper, the analysis of silicon oxynitride (SiON) films, deposited utilizing the plasma enhanced chemical vapor deposition (PECVD) process, for optical waveguides on silicon wafers is presented. The impact of N2O flow rate on various SiON film properties was investigated. The thickness and refractive index were measured by micro-spot spectroscopic reflectometry and confirmed by spectroscopic ellipsometry. The chemical composition of SiON films was analyzed using Secondary Ion Mass Spectrometry (SIMS). The surface roughness was analyzed using Atomic Force Microscopy (AFM). Increasing the N2O flow rate during deposition caused the deposition rate to increase and the refractive index to decrease. By changing the flow rate of gases into the chamber during the PECVD process, it is possible to precisely adjust the oxygen (O2) ratio and nitrogen (N2) ratio in the SiON film and thus control its optical properties. This was possibility utilized to fabricate SiON films suitable to serve as a waveguide core for optical waveguides with a low refractive index contrast.
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