退火(玻璃)
氧化物
材料科学
薄膜
热稳定性
氧化钒
X射线光电子能谱
金属
钒
透射率
分析化学(期刊)
化学工程
纳米技术
光电子学
化学
复合材料
冶金
有机化学
工程类
作者
Zhenfei Luo,Zhiming Wu,Tao Wang,Yadong Jiang
标识
DOI:10.1109/ipfa.2009.5232579
摘要
A two-step method was used to fabricate vanadium oxide (VO X ) thin films. SEM and IR transmittance spectra were employed to reveal the cross-section morphology and optical property, respectively. The surface composition was obtained using XPS. Experimental results indicated that the VO X film was stable until the grains and insulator-metal transition showed up on increasing annealing pressure or prolonging annealing time. The depositing conditions corresponding to the unstable film can be considered as the critical point of preparing suitable thermal sensitive layers that fulfill both stability and higher mid-wave IR absorption.
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