Proteus SMO for process window improvement

As technology continues to scale aggressively, source mask optimization (SMO) is now a key resolution enhancement technique (RET) to maximize the process window. Synopsys© has developed new source mask optimization tool Proteus SMO that demonstrated this improvement. Proteus SMO is equipped with comprehensive functionalities for computing the optimum source and mask. High flexibilities of source types, mask recipes, models, optimizers, and cost functions are provided. For enabling accurate simulation results, integration of Sentaurus Lithography (S-Litho) is also possible when needed. Moreover, the industrial-proven Inverse Lithography Technology (Proteus ILT) mask synthesis is integrated within Proteus SMO further maximizing the process window. Taking advantage of ILT and SLitho simulation solutions, Proteus SMO could achieve significant lithographic performance improvement.