欧姆接触
肖特基势垒
半导体
材料科学
纳米技术
制作
半导体器件
肖特基二极管
工程物理
光电子学
电子工程
工程类
二极管
病理
替代医学
医学
图层(电子)
作者
Shengyao Chen,S. Wang,Cong Wang,Zhongchang Wang,Qian Liu
出处
期刊:Nano Today
[Elsevier]
日期:2021-12-28
卷期号:42: 101372-101372
被引量:32
标识
DOI:10.1016/j.nantod.2021.101372
摘要
2D-material semiconductors with unique photonic and optoelectronic properties process ultralow energy consumption and are naturally compatible to semiconductor fabrication process, which show great potential in many applications such as memristors, optoelectronic probers, energy devices, and catalytic system. Generally, electrode fabrication process inevitably introduces a non-Ohmic contact between the semiconductor and its electrodes due to the Schottky barrier and gap states, thus raising energy consumption and limiting device performance. Recently, seamless-contact technologies have been developed, which can turn the semiconductor-electrode contact to be Ohmic by eliminating gap states and Schottky barrier, thereby having fundamental implications on 2D-material-based devices. This work will review the recent progresses of the seamless contacts from both theory and experiment aspect, summarize the existing difficulties, exploring improvement of metal-semiconductor contact and propose future exploration direction. This review is timely and helpful to improve the performance of 2D-material-based devices by introducing seamless contact and approaching the Ohmic contact.
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