期刊:Journal of Nanoelectronics and Optoelectronics [American Scientific Publishers] 日期:2021-12-01卷期号:16 (12): 1913-1922被引量:1
标识
DOI:10.1166/jno.2021.3145
摘要
Recently, nontoxic fabrication for Cu(In, Ga)Se 2 thin films gained increasing popularity. In this work, chemical bath deposition and Sol–gel methods were utilized in the fabrication of an environmentally buffer-window (ZnS-ZnO/ZnO:Al) layer system for Cu(In, Ga)Se 2 thin film devices. The influences of conditions like annealing temperature, coating times, and Al-doping amount were investigated. The surface morphology and optical properties illustrated a compact and uniform ZnS film with a band-gap of 3.78, which can be a good alternative to CdS film. Resistivity of 0.35 Ω·cm for the ZnO/ZnO:Al film was achieved by the ideal condition of 9 coating times and 5 Al-doping amounts. A cross-sectional view of the complete Cu(In, Ga)Se 2 thin film was obtained, and the structure status was analyzed.