溅射
溅射沉积
透射率
材料科学
电阻率和电导率
导电体
腔磁控管
光电子学
化学计量学
波长
薄膜
光学
分析化学(期刊)
化学
复合材料
电气工程
纳米技术
物理
工程类
有机化学
色谱法
作者
Takeshi Tanaka,Keishi KAWABATA,Masataka Hirose
标识
DOI:10.1016/0040-6090(96)08607-5
摘要
Optically transparent, conducting Cul films have been prepared by a magnetron sputtering technique which employs rf and dc target biases. It is shown that the stoichiometric Cul films are obtained at the target bias VT= −200 V, while the lowest resistivity of 5.4 × 10 −2Ω cm and the best optical transmittance of about 70% over the wavelength range 500 to 1000 nm are obtained at VT= −50 V where the I/Cu
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