蚀刻(微加工)
阳极
材料科学
微晶
多孔性
化学工程
各向同性腐蚀
基质(化学分析)
纳米技术
复合材料
电极
化学
冶金
图层(电子)
物理化学
工程类
作者
Byeong-Chul Yu,Yoon Hwa,Jae‐Hun Kim,Hun‐Joon Sohn
标识
DOI:10.1016/j.electacta.2013.11.158
摘要
Unlike previous HF etching of Si oxides to produce porous Si a new concept for the preparation of porous SiOx was suggested adopting Si as a pore generating agent and Si oxides as template using NaOH solution. The heat treatment of pristine SiO at 900 °C provided nano-crystalline Si within the SiOx matrix. The nano-crystalline Si was dissolved to provide pore size of 200∼500 nm, while most of the SiOx matrix remained as a template during NaOH etching. The surface area of the etched SiO was increased more than 5 times compared with not-etched SiO. The porous SiOx anode exhibited a stable reversible capacity of about 1240 mAh g−1 over 100 cycles at 0.2 C.
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