模板
材料科学
纳米技术
蚀刻(微加工)
结晶度
纳米管
涂层
碳纳米管
图层(电子)
复合材料
作者
Zhifeng Huang,Kenneth D. Harris,Michael J. Brett
标识
DOI:10.1002/adma.200900269
摘要
Arrays of silicon nanotubes (SiNTs) with controllable architectures, wall thicknesses and crystallinity are fabricated by a new template-assisted technique. The method includes a sequence of glancing angle deposition of the templates, low-pressure CVD shell-Si coating, ion-milling to expose the templates, and wet-chemical etching for template removal. The technique may be generally adapted to a wide variety of morphologies and NT materials. Detailed facts of importance to specialist readers are published as "Supporting Information". Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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