Determination of optimum deposition conditions amorphous silicon thin films

Abstract The aim of the study is to increase the efficiency of solar cell elements on the basis of thin films of amorphous-nanocrystalline silicon, by incorporating silicon nanocrystals (Si-NPs) into a film of hydrogenated amorphous silicon (a-Si:H). The purpose of the operation is to work out optimum deposition modes of amorphous silicon films. An obstacle here is the occurrence of dust particles affecting the properties of the resulting films. As well as increasing the overall efficiency of photocells due to the creation of single-crystal quantum dots (nanocristalites), which will play the role of centers of flow of parasitic currents. The obtained samples were studied using physical methods of analysis (Raman light scattering, study of the band gap).