光刻胶
纳米团簇
纳米颗粒
材料科学
极性(国际关系)
纳米技术
纳米尺度
聚合
聚合物
化学
图层(电子)
生物化学
复合材料
细胞
作者
Qianqian Wang,Michaela Vockenhuber,Hao Cui,Xiaolin Wang,Peipei Tao,Ziyu Hu,Jun Zhao,Jianlong Wang,Yasin Ekinci,Hong Xu,Xiangming He
标识
DOI:10.1002/smtd.202370052
摘要
Front Cover In article number 2300309, Ekinci, Xu, He, and co-workers obtained the classic ZrO2-nanoparticle photoresist as single crystals by controlled synthesis, based on which the patterning mechanisms were investigated by characterizations and theoretical calculations, including photoacid-induced polarity changes and radical polymerization reactions under high-energy radiation. This work reveals the origin of the sensitivity of this typical nanoparticle photoresist and provides new perspectives for future photoresist design.
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