偏振器
材料科学
光学
栅栏
光电子学
波导管
带宽(计算)
极化(电化学)
衍射光栅
硅
双折射
物理
电信
计算机科学
物理化学
化学
作者
Lei Zhang,Zhenzhao Guo,Xiaofei Gu,Jinbiao Xiao,Ting Feng,Shengbao Wu
出处
期刊:Optics Letters
[The Optical Society]
日期:2023-06-06
卷期号:48 (13): 3431-3431
被引量:9
摘要
A TM polarizer working for whole optical communication bands with high performance is proposed on a 220-nm-thick silicon-on-insulator (SOI) platform. The device is based on polarization-dependent band engineering in a subwavelength grating waveguide (SWGW). By utilizing an SWGW with a relatively larger lateral width, an ultra-broad bandgap of ∼476 nm (1238 nm-1714nm) is obtained for the TE mode, while the TM mode is well supported in this range. Then, a novel tapered and chirped grating design is adopted for efficient mode conversion, which results in a polarizer with a compact footprint (3.0 µm × 18 µm), low insertion loss (IL < 1.15 dB) and high polarization extinction ratio (PER > 21 dB) covering O-U bands (1260 nm-1675 nm). Experimental results show that the fabricated device has an IL < 1.0 dB and PER > 22 dB over a 300- nm bandwidth, which is limited by our measurement setup. To the best of our knowledge, no TM polarizer on the 220-nm SOI platform with comparable performance covering O-U bands has ever been reported.
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