高电子迁移率晶体管
材料科学
光电子学
电致发光
基质(水族馆)
电场
氮化镓
宽禁带半导体
阈值电压
晶体管
电压
图层(电子)
电气工程
纳米技术
物理
海洋学
量子力学
地质学
工程类
作者
Qiang Ma,Yuji Ando,Atsushi Tanaka,Akio Wakejima
标识
DOI:10.35848/1882-0786/ac8782
摘要
Abstract This paper investigated electroluminescence (EL) in AlGaN/GaN high electric mobility transistors fabricated on a free-standing GaN substrate (GaN-on-GaN) with ones on a SiC substrate (GaN-on-SiC) as a reference. When a drain voltage ( V ds ) of the GaN-on-GaN was increased, the EL peak was kept beside the gate, indicating that the highest electric field region stayed in the vicinity of the gate. On the other hand, EL of the GaN-on-SiC shifted from the gate to the drain electrode under an increased V ds . Our results indicate that the high-electric-field tolerance of GaN-on-GaN is higher than that of GaN-on-SiC, indicating that GaN-on-GaN is more suitable for high-voltage operation.
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