Silicon–carbon superhydrophobic nano-structure for next generation semiconductor industry

Abstract Superhydrophobic surfaces are important in waterproof applications that withstand harsh chemical exposure, ultraviolet radiation, and heat. Surface energy modification of the surface, such as silanization or (fluoro)polymer coatings, increases the hydrophobicity of the nanostructure. The present study follows a bilayer architecture that turns hydrophilic silicon into a superhydrophobic one. The first step creates a unique silicon–graphene hybrid structure on the silicon surface by coating graphene on the P-type silicon substrate. In the second step, low surface energy material (a combination of hexadecyltrimethoxysilane and hexamethyldisilazane) is coated by the dip coating process. This study investigates the durability of superhydrophobicity under severe mechanical, thermal, and chemical conditions. High-temperature tolerance and water jet tests are also performed. The present work also involves the study of coating regeneration. This approach can be applied to all shapes and sizes of silicon–graphene surfaces and is proven to be excellent in the semiconductor industry.