极紫外光刻
极端紫外线
光学
计算机科学
热的
功率(物理)
物理
激光器
量子力学
气象学
作者
Chien‐Ching Wu,M.P.M.A. Limpens,Jacqueline van Veldhoven,H. H. P. Th. Bekman,Alex Deutz,E. te Sligte,Arnold J. Storm,Michel van Putten
摘要
EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and related to simulated and measured performance of EBL2. This approach can also be applied to EUV pellicles and optics.
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