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Comparative evaluation of iodoacids removal by UV/persulfate and UV/H2O2 processes

化学 过硫酸盐 降级(电信) 光解 反应速率常数 羟基自由基 紫外线 过氧化氢 动力学 流出物 腐植酸 高级氧化法 水处理 量子产额 核化学 光化学 环境化学 激进的 环境工程 催化作用 有机化学 荧光 物理 电信 量子力学 计算机科学 肥料 工程类
作者
Yongjun Xiao,Lifeng Zhang,Wei Zhang,Kok-Yong Lim,Richard D. Webster,Teik‐Thye Lim
出处
期刊:Water Research [Elsevier BV]
卷期号:102: 629-639 被引量:229
标识
DOI:10.1016/j.watres.2016.07.004
摘要

To develop a cost-effective method for post-formation mitigation of iodinated disinfection by-products, degradation of iodoacids by UV, UV/PS (persulfate), and UV/H2O2 was extensively investigated in this study. UV direct photolysis of 4 iodoacids followed first-order kinetics with rate constants in the range of 2.43 × 10(-4)-3.02 × 10(-3) cm(2) kJ(-1). The derived quantum yields (Ф254) of the 4 iodoacids range from 0.13 to 0.34, respectively. A quantitative structure-activity relationship (QSAR) model was subsequently established and applied to predict the direct photolysis rates of 6 other structurally similar iodoacids whose standards are commercially unavailable. At a UV dose of 140 mJ cm(-2) which is typically applied for disinfection of drinking water, the removal percentages of 4 iodoacids were only between 3.35% and 34.7%. Thus, ICH2CO2H (IAA), the most photo-recalcitrant species, was selected as the target compound for removal in the UV/PS and UV/H2O2 processes. The IAA degradation rates decreased with increasing pH from 3 to 11 in both processes. Humic acid (HA) and HCO3(-) had inhibitory effects on IAA degradation in both processes. Cl(-) adversely affected the IAA degradation in the UV/PS process but had no effect in the UV/H2O2 process. Generally, in the deionized (DI) water, surface water, treated drinking water, and secondary effluent, UV/PS process is more effective than UV/H2O2 process for IAA removal, based on the same molar ratio of oxidant: IAA. SO4(-) generated in the UV/PS process yields a greater mineralization of IAA than HO in the UV/H2O2 process. IO3(-) was the predominant end-product in the UV/PS process, while I(-) was the major end-product in the UV/H2O2 process. The respective contributions of UV, HO, and SO4(-) for IAA removal in the UV/PS process were 7.8%, 14.7%, and 77.5%, respectively, at a specific condition (1.5 μM IAA, 60 μM oxidant, and pH 7). Compared to UV/H2O2 process, UV/PS was also observed as more cost-effective process based on the electrical energy per order (EE/O) and chemical cost.
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