功勋
光电子学
二极管
材料科学
兴奋剂
带隙
击穿电压
半导体
宽禁带半导体
功率半导体器件
异质结
电压
半导体器件
极限(数学)
工程物理
电气工程
纳米技术
物理
数学分析
数学
图层(电子)
工程类
作者
Jincheng Zhang,Pengfei Dong,Kui Dang,Yanni Zhang,Qinglong Yan,Hu Xiang,Jie Su,Zhihong Liu,Mengwei Si,Jiacheng Gao,Moufu Kong,Hong Zhou,Yue Hao
标识
DOI:10.1038/s41467-022-31664-y
摘要
Ultra-wide bandgap semiconductor Ga2O3 based electronic devices are expected to perform beyond wide bandgap counterparts GaN and SiC. However, the reported power figure-of-merit hardly can exceed, which is far below the projected Ga2O3 material limit. Major obstacles are high breakdown voltage requires low doping material and PN junction termination, contradicting with low specific on-resistance and simultaneous achieving of n- and p-type doping, respectively. In this work, we demonstrate that Ga2O3 heterojunction PN diodes can overcome above challenges. By implementing the holes injection in the Ga2O3, bipolar transport can induce conductivity modulation and low resistance in a low doping Ga2O3 material. Therefore, breakdown voltage of 8.32 kV, specific on-resistance of 5.24 mΩ⋅cm2, power figure-of-merit of 13.2 GW/cm2, and turn-on voltage of 1.8 V are achieved. The power figure-of-merit value surpasses the 1-D unipolar limit of GaN and SiC. Those Ga2O3 power diodes demonstrate their great potential for next-generation power electronics applications.
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