材料科学
偏振器
范德瓦尔斯力
光学
光电子学
薄膜
红外线的
波长
纳米技术
双折射
物理
分子
量子力学
作者
Nihar Ranjan Sahoo,Saurabh Dixit,Anuj Kumar Singh,Sang Hoon Nam,Nicholas X. Fang,Anshuman Kumar
标识
DOI:10.1002/adom.202101919
摘要
Abstract Integration of conventional mid to long‐wavelength infrared (IR) polarizers with chip‐scale platforms is restricted by their bulky size and complex fabrication. Van der Waals materials based polarizer can address these challenges due to its nonlithographic fabrication, ease of integration with chip‐scale platforms, and room temperature operation. In the present work, mid‐IR optical response of the sub‐wavelength thin films of α‐phase molybdenum trioxide (α‐MoO 3 ) is investigated for application toward high temperature mid‐IR transmission and reflection type thin film polarizer. To the authors’ knowledge, this is the first report of above room temperature mid‐IR optical response of α‐MoO 3 to determine the thermal stability of the proposed device. It is found that the α‐MoO 3 based polarizer retains high extinction ratio with peak value exceeding 10 dB, up to a temperature of 140 °C. The experimental findings are explained by natural in‐plane hyperbolic anisotropy of α‐MoO 3 in the mid‐IR, high temperature X‐ray diffraction and Raman spectroscopic measurements. This work opens up new avenues for naturally in‐plane hyperbolic van der Waals thin‐films to realize sub‐wavelength IR optical components without lithographic constraints.
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