辐照
偏压
阈值电压
电离辐射
材料科学
阈下传导
电压
噪音(视频)
光电子学
吸收剂量
原子物理学
化学
分析化学(期刊)
物理
晶体管
核物理学
图像(数学)
人工智能
计算机科学
量子力学
色谱法
作者
Xu Cui,Jiangwei Cui,Qiwen Zheng,Ying Wei,Yudong Li,Qi Guo
标识
DOI:10.1080/10420150.2022.2039928
摘要
The total ionizing dose response of 22nm bulk silicon nFinFETs with different bias conditions is investigated using 60Co γ-rays. The experimental results show that constant voltage stress (CVS) has an important effect on the electrical parameters of the devices. After the CVS experiment, the threshold voltage of the device shifts positively and the on-state current decreases. The threshold voltage of devices irradiated under ON bias and ON bias after CVS shifts positively, and the ON bias device has shown large degradation. The threshold voltages of devices irradiated under ALL0 bias and TG bias shift negatively. The on-state current of the device increases with the accumulation of irradiation dose. There is no significant change in the subthreshold swing and 1/f noise power spectrum of the device after irradiation, indicating that the irradiation produces fewer interface traps and border traps.
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