线性
CMOS芯片
晶体管
插入损耗
拓扑(电路)
电气工程
材料科学
光电子学
物理
电子工程
工程类
电压
作者
Taehun Kim,Hui Dong Lee,Bonghyuk Park,Seunghyun Jang,Sunwoo Kong,Changkun Park
出处
期刊:IEEE Microwave and Wireless Components Letters
[Institute of Electrical and Electronics Engineers]
日期:2022-12-01
卷期号:32 (12): 1443-1446
被引量:11
标识
DOI:10.1109/lmwc.2022.3192440
摘要
This study presents a high-linearity K - band single-pole double-throw (SPDT) switch with asymmetric topology in a 65-nm CMOS process for 5G applications. To simultaneously obtain high power-handling capability and high isolation in the Tx and Rx modes, respectively, we propose an SPDT switch using asymmetric topology and the stacked-transistor technique. In both the Tx/Rx modes, the proposed SPDT switch operates with an insertion loss of less than 2.1 dB and isolation better than 22.5 dB in the frequency range 20–25 GHz. At 22 GHz, the measurement results of the input 1-dB compression point (IP1 dB) are 32.5 and 4.7 dBm in Tx and Rx modes, respectively. The chip core size of the proposed SPDT switch is 0.03 mm2.
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