Studies on Mo doped vanadium oxide film by pulsed RF magnetron sputtering

Molybdenum doped vanadium oxide film on quartz and silicon substrates are grown by pulsed RF magnetron sputtering method. Surface morphology, phase analysis and oxide states are investigated by field emission scanning electron microscopy, X‐ray diffraction and X‐ray photoelectron spectroscopy techniques, respectively. Crystalline nature of the film deposited on both quartz and silicon are depicted. The transmittance and reflectance spectra recorded for the entire solar region. Further, optical constants viz. optical band gap and refractive index of the deposited films are estimated. Wavelength dependent low reflectance characteristic is observed for the deposited film on silicon. IR emittance (ε IR ) and sheet resistance (R s ) of the film are also evaluated. Copyright © 2017 John Wiley & Sons, Ltd.