欧姆接触
退火(玻璃)
材料科学
X射线光电子能谱
碳化硅
光电子学
冶金
纳米技术
化学工程
工程类
图层(电子)
作者
Stanislav Cichoň,Petr Macháč,Bohumil Barda,Marie Kudrnová
标识
DOI:10.1109/iitc.2011.5940323
摘要
Widespread Ni/SiC contact after annealing at high temperatures provides good ohmic contact. We managed to prepare Si/SiC annealed ohmic contacts with comparable qualities as Ni/SiC ones. However, the main benefit of these Si/SiC ohmic contacts lies in that they retain their ohmic properties even after they are etched off which brings grounds for promising secondary contacts. Etched contacts were analyzed by XPS and surface composition alteration was observed.
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