高电子迁移率晶体管
材料科学
氮化镓
宽禁带半导体
光电子学
电容
电子工程
工艺CAD
功率半导体器件
校准
功率(物理)
计算机科学
工程物理
晶体管
电气工程
电压
物理
工程类
计算机辅助设计
纳米技术
电极
工程制图
图层(电子)
量子力学
作者
Wei‐Chih Cheng,Po‐Heng Lin,Chih-Hung Lin,Yi-Wei Lien,Chih‐Yen Chen,Chia‐Hao Lee,Shyh‐Chiang Shen,Chih-Cherng Liao,Chunming Liu
标识
DOI:10.1109/wipdaasia58218.2023.10261931
摘要
Compared with Si-based devices, TCAD model calibration for GaN-based devices have yet to be well developed. In this work, we demonstrate a modeling methodology for AlGaN/GaN power HEMT development using a Sentaurus TCAD simulation package. The study focuses on investigating and modeling the influence of interfacial charges, interfacial traps, and bulk traps on the device characteristics. Additionally, the output capacitance of the device was identified as a valuable parameter for model evaluation. Through a systematic modeling extraction methodology, the calibrated models exhibited agreement with experimental electric characteristics. Consequently, these calibrated models may effectively predict the electric performances of novel AlGaN/GaN power HEMTs.
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