材料科学
电阻率和电导率
带隙
薄膜
粒度
相(物质)
化学计量学
微观结构
光电子学
复合材料
纳米技术
化学工程
分析化学(期刊)
化学
电气工程
工程类
有机化学
色谱法
作者
U. Chalapathi,P. Reddy Prasad,Sangaraju Sambasivam,K. Mallikharjuna,P. Rosaiah,Salh Alhammadi,Ammar M. Tighezza,Krishna Mohanarangam,Si-Hyun Park
标识
DOI:10.1016/j.jmrt.2023.08.058
摘要
Thin films composed of Cu3BiS3 have shown significant promise as light-harvesting materials because of their suitable optoelectronic properties and abundant, non toxic constituent elements. A large-grained, highly crystalline Cu3BiS3 films is a prerequisite for application of these layers in solar cells. We have grown large-grained, highly crystalline Cu3BiS3 films by a two-stage process via thermally evaporating Cu/Bi/Cu metallic layers and sulfurization at 400 oC for 30 min. The influence of the Cu/Bi ratio on the growth of Cu3BiS3 thin films was investigated by varying the Bi precursor thickness. The Cu/Bi ratio significantly influenced the structural, microstructural, optical, and electrical properties of Cu3BiS3 thin films. The Cu3BiS3 film synthesized with a Cu/Bi ratio of 4.35 contained Cu1.8S spurious phase, a non-uniform grain morphology, a direct optical bandgap of 1.41 eV, and an electrical resistivity of 75.5 Ωcm. Upon decreasing the Cu/Bi ratio from 3.38 to 2.77, the Cu1.8S spurious phase was eliminated, and phase-pure Cu3BiS3 was crystallized with a uniform grain morphology, particle size of 2–4 μm, direct bandgap of 1.42 eV, and electrical resistivity of 53.5 Ωcm. A further decrease in the Cu/Bi ratio from 2.77 to 2.54 resulted in a slight decrease in the grain size and electrical resistivity of the Cu3BiS3 films. This study demonstrates that Cu3BiS3 films synthesized with near-stoichiometric composition possess better structural, microstructural, optical, and electrical properties than those synthesized with Cu-rich composition and are suitable for use as solar cell absorber layer.
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