Development of electron beam lithography technique for large area nano structural color

Abstract Plasmonic color is a structural color generated via preferential light absorption and scattering in dielectric nanostructures. In this study, a large plasmonic color image was successfully fabricated by an electron beam lithography (EBL) system. A software program, referred to as P-color in this study, was developed to facilitate the conversion of a desired color bitmap image to a GDS file composed of multiple nano-patterns to realize plasmonic color. The relationship between the color, width, and pitch of the pattern structures was investigated under different area-dose conditions during EBL as basic data for plasmonic color image design. After establishing conversion techniques for both the large-capacity GDS and EBL files, a plasmonic color image sample with a size of 60 mm × 40 mm area (which is difficult to fabricate using a conventional point-type EBL system) was successfully fabricated.