材料科学
电致变色
三氧化钨
非阻塞I/O
氧化镍
氧化锡
化学工程
氧化铟锡
氧化物
电化学
镍
电极
钨
纳米技术
薄膜
冶金
生物化学
化学
物理化学
工程类
催化作用
作者
Nguyen Sy Pham,Luan Nguyen,Hà Trần Nguyên,Viet Nguyen,Tuyen Bich Thi Nguyen,Chau Tran,Bich Nguyen,Anh Quoc Khuong Nguyen
标识
DOI:10.1016/j.ceramint.2023.07.226
摘要
Herein, a facile triple pulse electrodeposition was used to fabricate porous films such as tungsten trioxide (WO3) and nickel oxide (NiO) on indium tin oxide (ITO) substrates. These porous films outperformed corresponding compact films formed by continuous electrodeposition in terms of long-term stability. The maximum transmittance modulation of P-WO3 and P–NiO films were 57.0% and 52.1%, respectively, and changed insignificantly after 10,000 cycles, whereas C-WO3 and C–NiO films were degraded after 2500 and 1000 cycles, respectively. Not only does the porous morphology increases the electrochemical active surface area, but it also provides an efficient pathway for ion diffusion and charge transfer, resulting in fast kinetics, low resistance, high electro-activity, and excellent ion reversibility. This work will hopefully inspire more researchers to improve electrodeposition film fabrication and promote electrochromic device industrialization.
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