作者
Mario Lanza,H.‐S. Philip Wong,Eric Pop,Daniele Ielmini,Dimitri Strukov,B. C. Regan,Luca Larcher,Marco A. Villena,J. Joshua Yang,Ludovic Goux,Attilio Belmonte,Yuchao Yang,Francesco Maria Puglisi,Jinfeng Kang,Blanka Magyari‐Köpe,Eilam Yalon,Anthony J. Kenyon,Mark Buckwell,Adnan Mehonić,Alexander L. Shluger,Haitong Li,Tuo‐Hung Hou,Boris Hudec,Deji Akinwande,Ruijing Ge,Stefano Ambrogio,J.B. Roldán,E. Miranda,J. Suñé,K. L. Pey,Xing Wu,Nagarajan Raghavan,Ernest Y. Wu,Wei Lü,G. Navarro,Weidong Zhang,Huaqiang Wu,Run‐Wei Li,Alexander W. Holleitner,Ursula Wurstbauer,Max C. Lemme,Ming Liu,Shibing Long,Qi Liu,Hangbing Lv,Andrea Padovani,Paolo Pavan,Ilia Valov,Xu Jing,Tingting Han,Kaichen Zhu,Shaochuan Chen,Fei Hui,Yuanyuan Shi
摘要
Abstract Resistive switching (RS) is an interesting property shown by some materials systems that, especially during the last decade, has gained a lot of interest for the fabrication of electronic devices, with electronic nonvolatile memories being those that have received the most attention. The presence and quality of the RS phenomenon in a materials system can be studied using different prototype cells, performing different experiments, displaying different figures of merit, and developing different computational analyses. Therefore, the real usefulness and impact of the findings presented in each study for the RS technology will be also different. This manuscript describes the most recommendable methodologies for the fabrication, characterization, and simulation of RS devices, as well as the proper methods to display the data obtained. The idea is to help the scientific community to evaluate the real usefulness and impact of an RS study for the development of RS technology.