71.1: High Throughput and Scalable Spatial Atomic Layer Deposition of Al2O3 as a Moisture Barrier for Flexible OLED Display

We have developed high throughput and scalable space divided atomic layer deposition (ALD) system for thin filmencapsulation (TFE) of flexible OLEDs display. In this paper, we report high moisture barrier properties of Al 2 O 3 films deposited by our new developed high throughput (70 Å/min) spatial ALD with 2G glass substrate size (370 × 470 mm 2 ). The WVTR on flexible substrate could achieve ∼10 −5 g/m 2 ‐day under tritium test.