Defect effect on the performance of nonpolar GaN-based ultraviolet photodetectors

响应度 材料科学 光电子学 紫外线 光电探测器 位错 肖特基势垒 暗电流 肖特基二极管 氮化镓 堆积 叠加断层 电子 宽禁带半导体 纳米技术 物理 复合材料 核磁共振 二极管 量子力学 图层(电子)
作者
Yuhui Yang,Wenliang Wang,Yulin Zheng,Jiawen You,Siyu Huang,Kefeng Wu,Deqi Kong,Zhengtang Luo,Hong Chen,Guoqiang Li
出处
期刊:Applied Physics Letters [American Institute of Physics]
卷期号:118 (5) 被引量:40
标识
DOI:10.1063/5.0040110
摘要

The anisotropy of GaN(11-20) makes it possible to fabricate polarized ultraviolet (UV) photodetectors (PDs) for applications in fields such as remote sensing and airborne astronomical navigation. The defect density has a significant effect on the performance of GaN(11-20)-based UV PDs. However, the mechanism through which different defects and their densities affect the performance of these devices is unclear. Therefore, in this work, we investigated the mechanisms of the screw or mixed dislocation, edge dislocation, and basal stacking fault (BSF) densities affecting the dark current, responsivity, and response time of GaN (11-20)-based PDs, respectively. We observed that the screw or mixed dislocation increased the dark current mainly through reducing the Schottky barrier height and forming leakage current, whereas the edge dislocation and BSF decreased the responsivity by reducing the electron mobility. Furthermore, all the three types of defects increased the response time through forming traps to recombine the holes with electrons and thus delaying the escape of carriers. These results are highly significant for developing nonpolar GaN-based UV PDs.
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