聚二甲基硅氧烷
立体光刻
化学
固化(化学)
弹性体
3d打印
软光刻
紫外线固化
平版印刷术
纳米技术
3D打印
拉曼光谱
化学工程
复合材料
高分子化学
材料科学
有机化学
光电子学
制作
生物医学工程
医学
替代医学
物理
光学
病理
工程类
作者
Christian Rolando,Shanliang Deng,Ziad Mahmoud,Ziad Mahmoud,Aufrid T.M. Lenferink,Aurélie Costa,Fabrice Bray,Christian Rolando,Séverine Le Gac
标识
DOI:10.1021/acs.analchem.0c04944
摘要
Three-dimensional (3D)-printing techniques such as stereolithography (SLA) are currently gaining momentum for the production of miniaturized analytical devices and molds for soft lithography. However, most commercially available SLA resins inhibit polydimethylsiloxane (PDMS) curing, impeding reliable replication of the 3D-printed structures in this elastomeric material. Here, we report a systematic study, using 16 commercial resins, to identify a fast and straightforward treatment of 3D-printed structures and to support accurate PDMS replication using UV and/or thermal post-curing. In-depth analysis using Raman spectroscopy, nuclear magnetic resonance, and high-resolution mass spectrometry revealed that phosphine oxide-based photo-initiators, leaching out of the 3D-printed structures, are poisoning the Pt-based PDMS catalyst. Yet, upon UV and/or thermal treatments, photo-initiators were both eliminated and recombined into high molecular weight species that were sequestered in the molds.
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