挠曲电
材料科学
铁电性
薄膜
外延
电场
纳米技术
光电子学
凝聚态物理
电介质
物理
图层(电子)
量子力学
作者
D. Lee,Byung Chul Jeon,Aram Yoon,Yeong Jae Shin,Myang Hwan Lee,Tae Kwon Song,Sang Don Bu,Miyoung Kim,Jin‐Seok Chung,Jong‐Gul Yoon,Tae Won Noh
标识
DOI:10.1002/adma.201400654
摘要
Flexoelectric control of defect formation and associated electronic function is demonstrated in ferroelectric BiFeO3 thin films. An intriguing, so far never demonstrated, effect of internal electric field (Eint) on defect formation is explored by a means of flexoelectricity. Our study provides novel insight into defect engineering, as well as allows a pathway to design defect configuration and associated electronic function.
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