硅烷
接触角
化学气相沉积
材料科学
三氯氢硅
润湿
化学工程
X射线光电子能谱
磨损(机械)
氧化硅
涂层
二次离子质谱法
聚合物
基质(水族馆)
等离子体增强化学气相沉积
椭圆偏振法
硅
图层(电子)
薄膜
复合材料
纳米技术
化学
有机化学
离子
氮化硅
冶金
工程类
地质学
海洋学
作者
Gaurav Saini,Ken Sautter,Frank E. Hild,J. L. Pauley,Matthew R. Linford
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:2008-08-20
卷期号:26 (5): 1224-1234
被引量:24
摘要
This article describes a two-silane, chemical vapor deposition (CVD) approach to creating hydrophobic (or even superhydrophobic), abrasion-resistant coatings on silicon oxide and polymer (nylon) substrates. This multistep approach employs only reagents delivered in the gas phase, as follows: (i) plasma cleaning/oxidation of the substrate, (ii) CVD of 3-isocyanatopropyltriethoxysilane, which is used as an adhesion promoter for the substrate, (iii) hydrolysis with water vapor, and (iv) CVD of (tridecafluoro-1,1,2,2-tetrahydrooctyl)trichlorosilane (the “Rf-Cl silane”). Surfaces are characterized by wetting, spectroscopic ellipsometry, x-ray photoelectron spectroscopy (XPS), and time-of-flight secondary ion mass spectrometry (ToF-SIMS). This work has the following unique features. First, the authors explore an all gas phase deposition of a new silane coating that is scientifically interesting and technologically useful. Second, the authors show that the presence of an adhesion promoter in the process leads to thinner films that are more robust in abrasion testing. Third, results obtained using plasma/deposition equipment that is relatively inexpensive and/or available in most laboratories are compared to those obtained with a much more sophisticated, commercially available plasma/CVD system (the YES-1224P). The entire deposition process can be completed in only ∼1h using the industrial equipment (the 1224P). It is of significance that the polymer surfaces modified using the 1224P are superhydrophobic. Fourth, the thickness of the Rf-Cl silane layer deposited by CVD correlates well with the thickness of the underlying spin coated nylon surface, suggesting that the nylon film acts as a reservoir of water for the hydrolysis and condensation of the Rf-Cl silane.
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