材料科学
微观结构
溅射沉积
超晶格
拉曼光谱
X射线光电子能谱
扫描电子显微镜
冶金
溅射
图层(电子)
薄膜
复合材料
光电子学
光学
化学工程
纳米技术
物理
工程类
作者
Harish C. Barshilia,B. Deepthi,K.S. Rajam,Kanwal Preet Bhatti,Sujeet Chaudhary
出处
期刊:Journal of vacuum science & technology
[American Institute of Physics]
日期:2008-12-08
卷期号:27 (1): 29-36
被引量:62
摘要
TiAlN and CrAlN coatings were prepared using a reactive direct current magnetron sputtering system from TiAl and CrAl targets. Structural characterization of the coatings using x-ray diffraction (XRD) revealed the B1 NaCl structure of TiAlN and CrAlN coatings with a prominent reflection along the (111) plane. The XPS data confirmed the bonding structures of TiAlN and CrAlN single layer coatings. Subsequently, nanolayered multilayer coatings of TiAlN∕CrAlN were deposited on silicon and mild steel (MS) substrates at different modulation wavelengths (Λ) with a total thickness of approximately 1.0μm. The modulation wavelengths were calculated from the x-ray reflectivity data using modified Bragg’s law. TiAlN∕CrAlN multilayer coatings were textured along (111) for Λ<200Å and the XRD patterns showed the formation of superlattice structure for coatings deposited at Λ=102Å. The x-ray reflectivity data showed reflections of fifth and seventh orders for multilayer coatings deposited at Λ=102 and 138Å, respectively, indicating the formation of sharp interfaces between TiAlN and CrAlN layers. The cross-sectional scanning electron microscopy image of TiAlN∕CrAlN multilayer coatings indicated a noncolumnar and dense microstructure. A maximum hardness of 39GPa was observed for TiAlN∕CrAlN multilayer coatings deposited at Λ=93Å, which was higher than the rule-of-mixture value (30GPa) for TiAlN and CrAlN. Study of thermal stability of the coatings in air using micro-Raman spectroscopy indicated that the TiAlN∕CrAlN multilayer coatings were stable up to 900°C in air. TiAlN∕CrAlN multilayer coatings also exhibited improved corrosion resistance when compared to the MS substrate.
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