共发射极
材料科学
光电子学
击穿电压
异质结
化学气相沉积
双极结晶体管
晶体管
蓝宝石
异质结双极晶体管
电流密度
宽禁带半导体
电介质
分析化学(期刊)
电压
电气工程
化学
物理
光学
工程类
量子力学
激光器
色谱法
作者
Huili Grace Xing,P. Chavarkar,S. Keller,Steven P. DenBaars,Umesh K. Mishra
出处
期刊:IEEE Electron Device Letters
[Institute of Electrical and Electronics Engineers]
日期:2003-03-01
卷期号:24 (3): 141-143
被引量:46
标识
DOI:10.1109/led.2003.811400
摘要
N-p-n Al/sub 0.05/GaN/GaN heterojunction bipolar transistors with a common emitter operation voltage higher than 330 V have been demonstrated using selectively regrown emitters. Devices were grown by metalorganic chemical vapor deposition on sapphire substrates. The n-type emitter was grown selectively on a 100-nm-thick p-base with an 8 μm n-collector structure using a dielectric mask. The shallow etch down to the collector mitigates damages induced in the dry etch, resulting a low leakage and a high breakdown. The graded AlGaN emitter results in a common emitter current gain of /spl sim/18 at an average collector current density of up to 1 kA/cm 2 at room temperature.
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