X射线光电子能谱
紫外光电子能谱
铟
氧化铟锡
溅射
锡
工作职能
材料科学
氧化物
光谱学
光电发射光谱学
分析化学(期刊)
光电子学
化学
纳米技术
冶金
金属
核磁共振
薄膜
物理
色谱法
量子力学
作者
Y. Park,Vi‐En Choong,Y. Gao,B.J. Hsieh,Ching W. Tang
摘要
We used ultraviolet and x-ray photoelectron spectroscopy (XPS) and (UPS) techniques to directly measure absolute values of vacuum work function of indium tin oxide (ITO) thin films. We obtained a work function of 4.4–4.5 eV which is lower than the commonly cited value. These values do not change substantially by heating and Ar ion sputtering. The atomic concentrations of each element in ITO, measured with XPS, are also quite stable under heat treatment and ion sputtering.
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