Radiation damage of amorphous silicon, thin‐film, field‐effect transistors

材料科学 阈值电压 光电子学 辐照 场效应晶体管 阈下传导 退火(玻璃) 晶体管 泄漏(经济) 辐射 电压 光学 电气工程 宏观经济学 工程类 物理 复合材料 经济 核物理学
作者
J. Boudry,L Antonuk
出处
期刊:Medical Physics [Wiley]
卷期号:23 (5): 743-754 被引量:56
标识
DOI:10.1118/1.597668
摘要

The effect of 60 Co radiation on the noise and drain‐source current characteristics of hydrogenated amorphous silicon ( a ‐Si:H) field‐effect transistors (FETs) was examined as a function of dose to cumulative doses as high as ∼2×10 4 Gy. Following these measurements, room‐temperature and elevated‐temperature annealing of induced radiation damage was examined. The FETs examined are representative of those incorporated in a ‐Si:H arrays under development for various x‐ray medical imaging applications. No significant effect upon the noise characteristics of the FETs was observed as a result of the radiation. The predominant drain‐source current effect with increasing dose was a shift of the transfer characteristic toward negative gate voltage and/or a decrease of the transfer characteristic subthreshold slope. This resulted in large increases in leakage current for gate voltages where the FETs were initially highly nonconducting. This leakage current increase was less pronounced for more negative gate voltages and was further diminished by maintaining the FETs at a more negative gate voltage during the irradiation. Following the radiation measurements, room‐temperature annealing resulted in a 10% to 50% reduction in the leakage current in the first day followed by a logarithmic decrease thereafter. Elevated‐temperature annealing for 2 h at 200 °C restored FET leakage current and threshold voltage properties to their preirradiation values. The irradiation effects are small for cumulative doses less than ∼100 Gy, which is larger than the clinical lifetime dose for an imaging detector for chest radiography or for fluoroscopy (with infrequent exposure to the direct beam). For significantly higher dose applications such as mammography, fluoroscopy (with frequent direct beam exposure), and radiotherapy imaging, the results suggest that periodic elevated‐temperature annealing or operation of the arrays at more negative gate voltages may be necessary.

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