单层
材料科学
异质结
成核
二硫化钼
纳米技术
过渡金属
过饱和度
蒸发
光致发光
Crystal(编程语言)
薄膜
化学工程
光电子学
有机化学
复合材料
工程类
催化作用
物理
化学
热力学
程序设计语言
计算机科学
作者
Juwon Lee,Sangyeon Pak,Paul Giraud,Young‐Woo Lee,Yuljae Cho,John Hong,A‐Rang Jang,Hee‐Suk Chung,Woong‐Ki Hong,Hu Young Jeong,Hyeon Suk Shin,Luigi G. Occhipinti,Stephen M. Morris,SeungNam Cha,Jung Inn Sohn,Jong Min Kim
标识
DOI:10.1002/adma.201702206
摘要
Transition metal dichalcogenide (TMDC) monolayers are considered to be potential materials for atomically thin electronics due to their unique electronic and optical properties. However, large‐area and uniform growth of TMDC monolayers with large grain sizes is still a considerable challenge. This report presents a simple but effective approach for large‐scale and highly crystalline molybdenum disulfide monolayers using a solution‐processed precursor deposition. The low supersaturation level, triggered by the evaporation of an extremely thin precursor layer, reduces the nucleation density dramatically under a thermodynamically stable environment, yielding uniform and clean monolayer films and large crystal sizes up to 500 µm. As a result, the photoluminescence exhibits only a small full‐width‐half‐maximum of 48 meV, comparable to that of exfoliated and suspended monolayer crystals. It is confirmed that this growth procedure can be extended to the synthesis of other TMDC monolayers, and robust MoS 2 /WS 2 heterojunction devices are easily prepared using this synthetic procedure due to the large‐sized crystals. The heterojunction device shows a fast response time (≈45 ms) and a significantly high photoresponsivity (≈40 AW −1 ) because of the built‐in potential and the majority‐carrier transport at the n–n junction. These findings indicate an efficient pathway for the fabrication of high‐performance 2D optoelectronic devices.
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