材料科学
铁电性
光电子学
异质结
非易失性存储器
电介质
晶体管
场效应晶体管
纳米技术
电压
电气工程
工程类
作者
Prashant Singh,Sungpyo Baek,Hyun Ho Yoo,Jingjie Niu,Jin‐Hong Park,Sungjoo Lee
出处
期刊:ACS Nano
[American Chemical Society]
日期:2022-03-02
卷期号:16 (4): 5418-5426
被引量:64
标识
DOI:10.1021/acsnano.1c09136
摘要
Channel current conduction modulation with the spontaneous polarization of ferroelectric films in ferroelectric field-effect transistors (FeFETs) has been widely investigated. Low interface quality and thermodynamic instability owing to the presence of dangling bonds in the conventional ferroelectrics have limited the memory retention and endurance of FeFETs. This, in turn, prevents their commercialization. However, the atomically thin nature of 2D ferroelectric, semiconducting, and insulating films facilitate the achievement of trap-free interfaces as van der Waal heterostructures (vdWHs) to develop FeFETs with long data retention and endurance characteristics. Here, we demonstrate a 2D vdWH FeFET fabricated with ferroelectric CuInP2S6 (CIPS), hexagonal boron nitride (h-BN) as the dielectric, and InSe as the ferroelectric semiconductor channel. The device shows an excellent performance as nonvolatile memory (NVM) with its large memory window (4.6 V at a voltage sweep of 5 V), high drain current on/off ratio (>104), high endurance, and long data retention (>104 s). These results demonstrate the considerable potential of vdWHs for the development of FeFETs for logic and NVM applications.
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