MOSFET
碳化硅
功率MOSFET
电力电子
电气工程
材料科学
氮化镓
功率半导体器件
电容
数码产品
光电子学
电子工程
电压
工程物理
工程类
晶体管
物理
纳米技术
电极
冶金
量子力学
图层(电子)
作者
Edemar O. Prado,Pedro C. Bolsi,Hamiltom C. Sartori,J.R. Pinheiro
出处
期刊:Energies
[MDPI AG]
日期:2022-07-20
卷期号:15 (14): 5244-5244
被引量:43
摘要
This work presents a comparative analysis among four power MOSFET technologies: conventional Silicon (Si), Superjunction (SJ), Silicon Carbide (SiC) and Gallium Nitride (GaN), indicating the voltage, current and frequency ranges of the best performance for each technology. For this, a database with 91 power MOSFETs from different manufacturers was built. MOSFET losses are related to individual characteristics of the technology: drain-source on-state resistance, input capacitance, Miller capacitance and internal gate resistance. The total losses are evaluated considering a drain-source voltage of 400 V, power levels from 1 kW to 16 kW (1 A–40 A) and frequencies from 1 kHz to 500 kHz. A methodology for selecting power MOSFETs in power electronics applications is also presented.
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