Microlithography

EXPOSURE SYSTEM System Overview of Optical Steppers and Scanners Michael S. Hibbs Optical Lithography Modeling Chris A. Mack Optics for Photolithography Bruce W. Smith Excimer Laser for Advanced Microlithography Palash Das Alignment and Overlay Gregg M. Gallatin Electron Beam Lithography System Kazuaki Suzuki X-Ray Lithography Takumi Ueno EUV Lithography Stefan Wurm and Charles Gwyn Imprint Lithography Douglas J. Resnick RESISTS AND PROCESSING Chemistry of Photoresist Materials Takumi Ueno and Robert D. Allen Resist Processing Bruce W. Smith Multilayer Resist Technology Bruce W. Smith and Maureen Hanratty Dry Etching of Photoresists Roderick R. Kunz METROLOGY AND NANOLITHOGRAPHY Critical-Dimensional Metrology for Integrated-Circuit Technology Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur Electron Beam Nanolithography Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar Index