偏振器
材料科学
消光比
栅栏
光学
平版印刷术
纳米光刻
光电子学
电子束光刻
极化(电化学)
制作
透射率
波长
纳米技术
抵抗
替代医学
图层(电子)
化学
物理化学
病理
双折射
物理
医学
作者
Wentao Yuan,Xiaohang Pan,Shuoqiu Tian,Yifang Chen
摘要
Subwavelength grating (SWG) is currently the major component being applied in polarimetric detections in infrared wavelengths, owing to its unique advantages in miniaturized dimensions, integrability with the exiting planar focal plane array of photoelectronic detectors, and compatibility with semiconductor technology. However, the obstacle hindering the applications of the SWGs polarizer is the limited polarization performance of both the transmittance and the extinction ratio, despite substantial efforts have been reported. It has been well understood that SWG with short pitch and high aspect ratio is the solution for achieving high performance, which is a daunting challenge to nanofabrication. To overcome the technical bottleneck for highly dense gratings with high aspect ratio, this work proposed a structure with the metallic grating parasitically grown on the sidewalls of replicated dielectric lines/spaces by electron beam lithography, followed by an angled evaporation process of metal. Numerical simulations by a finite-difference time-domain method were carried out to optimize the structural dimensions for achieving both high transmittances and extinction ratios. Electron beam lithography together with angled depositions of an aluminum (Al) film was applied to fabricate the proposed SWG polarizers with the aspect ratio as high as 13:1. Optical characterizations demonstrated enhanced polarization performances in short infrared wavelengths from 1050 up to 1600 nm. The developed SWG polarizer and the fabrication technique possess advantages in the simplified process, lift off free and wafer scale prospect.
科研通智能强力驱动
Strongly Powered by AbleSci AI