材料科学
脉冲激光沉积
外延
薄膜
氧气
分压
氧气压力
转变温度
相变
相(物质)
沉积(地质)
分析化学(期刊)
冶金
光电子学
化学工程
纳米技术
凝聚态物理
超导电性
化学
有机化学
图层(电子)
色谱法
工程类
物理
古生物学
沉积物
生物
作者
Xiaodong Ao,Liwen Zhu,Renhong Liang,Yu Wang,Mao Ye,Ren‐Kui Zheng,Shanming Ke
标识
DOI:10.1016/j.scriptamat.2023.115745
摘要
The epitaxial growth of Sr3Ru2O7 thin films in the Ruddlesden-Popper type remains a challenge as the growth temperature required for a typical pulsed laser deposition (PLD) process can be as high as 1100 °C. In this study, high quality Sr3Ru2O7 epitaxial thin films were obtained using PLD with a single SrRuO3 target. By adjusting the oxygen partial pressure, the structure underwent a phase transition from SrRuO3 to Sr3Ru2O7 facilitated by the formation and development of oxygen and ruthenium vacancies. Remarkably, for the first time, high-quality Sr3Ru2O7 thin films with good crystalline quality were successfully grown at a low temperature of 680 °C on SrTiO3 substrates.
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