Directed self‐assembly of block copolymer thin films via momentary thickness gradients

Abstract In this study, a novel method to fabricate highly aligned lamellar nanostructures in a millimeter‐scale large area was demonstrated by directing the self‐assembly of block copolymer (BCP) thin films with a temporary thickness‐gradient micropattern via simple two‐step thermal annealing. In the first step of thermal annealing, the BCP nanostructure is latently guided by a phenomenon known as “geometric anchoring” for the area with a thickness gradient. The second annealing step causes thermal reflow of the height gradient micropattern with a sufficiently large curvature to flatten the micropattern. The shear stress generated by thermal reflow enlarged the grain of the BCP nanostructure, resulting in a highly aligned lamellar pattern over the entire area. Finally, the formation of periodic nanopatterns in large area was ensured by performing grazing‐incidence small‐angle x‐ray scattering. This innovative approach in directing the BCP self‐assembly promotes the fabrication of highly aligned nanostructures in large areas through cost‐effective and simple thermal imprinting method and designed two‐step heat treatment.